Electronics materials TOAGOSEI
  • High purity TRIES
    • "High purity TRIES" is an alkoxysilane which our company has industrialized for the first time in the world.
    It is used as a material for SiO2 film in semiconductors and liquid crystals. Deposition can be accomplished at low temperatures due to its high reactivity. It also has superior embedding capability and good flattening ability.


  • High purity hexachlorodisilane
    • "High purity hexachlorodisilane (HCD)" is a deposition material for semiconductors which our company industrialized for the first time in the world.
    It is greatly anticipated as a CVD (chemical vapor deposition) material for SiN film in the next generation of semiconductors.


  • Functional spherical silica
    • "Functional spherical silica" is a completely new type of spherical silica which was created using our unique manufacturing technology.
    It has high sphericity and a sharp particle size distribution. Our product line-ups include nano- to micro-silica particles.
    Electron micrograph of HPS®-3500

    >Representative grades

    		Appearance Average particle diameter
    HPS®-3500 series White fine powder 3.5
    HPS®-1000 White fine powder 1.0
    HPS®-0500 White fine powder 0.5

    >Main properties
    Categories Units Representative values
    Compositions
      Silicon dioxide
      Water
      Aluminum
      Iron
      Uranium
      Thorium
    %
    %
    ppm
    ppm
    ppb
    ppb
    >99.0
    < 1.0
    < 5
    < 5
    < 0.1
    < 0.1
    Water soluble impurities (120br>   Sodium ion
      Chloride ion
    ppm
    ppm
    <0.5
    <0.5
    Extracted water properties (1204h)
      pH
      Electrical conductivity
    -
    cm
    5.5
    <10

    >Examples of applications
  • Encapsulating resin in LSI package
  • Adhesives for high purity semiconductors
  • Underfill materials
  • Fillers such as sealants for liquid crystals
  • Anti-blocking agents for film

    • COPYRIGHT 2008 TOAGOSEI CO., LTD.